3D Matter Made to Order

Karlsruhe-Heidelberg Additive Nanomanufacturing Platform

The Karlsruhe-Heidelberg Additive Nanomanufacturing Platform (KHAMP) is an integrative platfrom to accelerate cycled iterations that combine materials and printing method development. It allows researchers in the Cluster to combine their technologies, and to flexibly perform experiments that combine different printing technologies and materials.

It is located between KIT Campus South (LTI), Campus North (IMT, INT) and innovationLab Heidelberg. Please click on the respective instrument to find out more, as well as the contact person and location.

Equipment PiXDRO LP50 Inkjet Printer
Max. substrate size 227 x 327 mm
Max. substrate thickness 25 mm
Substrate temperature control Heating up to 90 °C
Stage accuracy +/- 20 μm
Stage precision +/- 5 μm
Print speed Up to 500 mm/s
Ink viscosity 2 – 20 cP

Key features

  • Compatible with solvent based, aqueous, hotmelt and UV-curable inks
  • Vision systems for drop inspection, substrate alignment and print inspection
  • Accurate 5-axis motion systems
  • Substrate chuck heating
  • All industrial components
  • UV-LED for pinning while printing

Access/Contact

Qiaoshuang Zhang, qiaoshuang.zhang∂kit.edu, +49 721 608-47189

Location

KIT Campus South, Light Technology Institute (LTI), Building 30.34, Engesserstrasse 13, 76131 Karlsruhe

Printing technology Contact free, direct writing aerosol deposition
Feature size <10µm up to >1000µm, interchangeable nozzles
Stage accuracy (X/Y/Z) +/- 2 µm
Wide ink compatibility Viscosity: 1 – 1000 cP, Nanoparticles: <500nm
Print speed Up to >20mm/s
Direct Curing High Power UV LEDs & 1W 830nm IR cw-laser

Key Benefits

  • High-speed 2.5D microfabrication on 350mm x 250mm interchangeable heated vacuum platen
  • Full 3D microfabrication on 5-Axis coordinated motion stage with a working area of 200mm x 300mm x 200mm
  • System and Process Control Software for operation, parameter control and pattern specification
  • Low volume & temperature fabrication
  • Comparatively large working distance to substrate >2mm
  • Multiple deposition layers easily possible
  • Integrated alignment function

Access

Access to the cleanroom of the Light Technology Institute (LTI) is possible after introduction. Special introduction for the Novacentrix required. Introduction to the Optomec Aerosol jet is only possible under restricted conditions and requires several days of training. To gain access, please contact Qiaoshuang Zhang, Robert Huber or Prof. Uli Lemmer.

Curing technology Photonic curing tool
Peak radiant power 4,9kW/cm2
Max radiant energy 46J/cm2
Curing dimension per pulse 75mm x 150mm
Output spectrum 200-1.500nm
Pulse length 25-100.000µs
Max puls rate >kHz

Key Benefits

  • Compatibility with any printing method
  • Nano- & micro-scale ins possible
  • Ultra fast, repeatable curing
  • Fully customizable pulse structures
  • Significantly better sintering results compared to standard curing procedures
  • Sintering under inert atmosphere (e.g. Copper sintering)
  • Highly user friendly

Access

Access to the cleanroom of the Light Technology Institute (LTI) is possible after introduction. Special introduction for the Novacentrix required. Introduction to the Optomec Aerosol jet is only possible under restricted conditions and requires several days of training. To gain access, please contact Qiaoshuang Zhang, Robert Huber or Prof. Uli Lemmer.

Materials Al2O3, SiO2, TiO2
Processing Temperature 50 - 500 °C
Film Thickness nanometer regime
Maximum Sample Dimensions 100 x 100 x 100 mm3

Key Benefits

  • Highly uniform and conformal films
  • Dense, crack-, defect- and pinhole-free films
  • Coating of 3D structures, high-aspect ratios and porous materials

Location and Access

The atomic layer deposition facility is commissioned soon and is located at IMT, Campus North. Contact person: Dr. Judith Hohmann, Judith.hohmann∂kit.edu, 0721 608-22141.

Printing technology Inkjet printer
Minimum XY feature size 1 µm
Finest XY resolution 0.1 µm
Object height several tenths of µm
Print speed several hundreds of mm/s

Key Benefits

  • Micron scale patterns
  • Large viscosity range 0.5 cps - 10000 cps
  • Large variety of inks (metals, semiconductor, insulator, proteins, bio inks, …)
  • Inkjet printed micro bumps
  • Femtolitre dropvolumes

Access

Any scientist who wants to use the printer needs to get a safety briefing for working in the lab, where the printer is located, as well as an introduction to the printer. To receive the safety briefing and introduction, please contact Gabriel Cadilha Marques (gabriel.marques∂kit.edu).

Location

The Printer is located at the Institute of Nanotechnology, KIT Campus North, Building 640, Herman-von-Helmholtz-Platz 1, 76344 Eggensten-Leopoldshafen

Printing technology Inkjet printer
Stage accuracy +/- 1 µm
Print area 34.5 cm x 37 cm
Substrate thickness up to 35mm
Substrate rotation +/- 3 degrees with <0,2 µm accuracy
Temperature control 0 to 60°C
Laser processing >1W ~450 fs pulsed laser with three wavelengths, plus 3 cw-lasers

Key Benefits

  • Automated process, from printing to post processing and annealing
  • Different printheads
  • Dropwatcher with drop analysis
  • UV LED for pinning and IR lamp for curing during or after printing process
  • Air humidity control in printing area
  • Post processing capabilities using lasers, with additional printing steps possible afterwards
  • Automatic nozzle calibration and deactivation of malfunctioning ones
  • Available space for custom processing equipment in the machine
  • Optical beampath of lasers can be expanded

Access

The printer is located in a cleanroom. Access requires an introduction to the cleanroom, an access card and participation in a monthly general safety introduction. Furthermore it is required to have attended a laser safety introduction within the last year. An introduction to the machine is mandatory. For all inquiries please contact Christian Rainer (Christian.rainer∂kit.edu, +49 6221 54 19140).

Location

InnovationLab Heidelberg, 79115 Heidelberg, Speyerer Straße 4